File:Trench doubling.svg
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Size of this PNG preview of this SVG file: 392 × 487 pixels. Other resolutions: 193 × 240 pixels | 386 × 480 pixels | 618 × 768 pixels | 824 × 1,024 pixels | 1,648 × 2,048 pixels.
Original file (SVG file, nominally 392 × 487 pixels, file size: 3 KB)
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 10:48, 26 November 2011 | | 392 × 487 (3 KB) | commons>Wdwd | == {{int:filedesc}} == {{Information |Description={{en|The basic process for doubling trenches or holes. * Top: Photoresist is coated over the starting trench or hole pattern. * Center: Holes or trenches are exposed and etched into the underlying layer. * |
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